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MenuAPIX/APIMS δQ is designed for continuous automated measurement of trace impurities in ultra-high-purity process gases. API-MS technology provides high sensitivity for contaminants including H₂, CH₄, H₂O, CO, N₂, O₂, Ar, CO₂, Kr, and Xe, depending on the bulk gas being analyzed.
The system combines automatic switching and calibration with rapid online measurement, enabling fast detection of changes in gas-supply quality and helping protect sensitive manufacturing processes.
APIX/APIMS Quattro™ extends this concept by integrating up to four analyzers into a single system. This enables simultaneous monitoring of up to four different ultra-high-purity gases and rapid contamination detection across complex gas distribution systems.
The systems are primarily designed for monitoring UHP N₂, Ar, He, and H₂ used in semiconductor and electronics manufacturing, where even trace levels of moisture, oxygen, or other impurities can affect product quality and manufacturing yield.
Integration with plant control systems and automated operation makes the analyzers suitable for continuous online gas quality control and early detection of gas-supply excursions.
